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  • Tantalum silicide recovery

    Tantalum silicide recovery_ Recovery price of tantalum containing compounds_ Rare metal recycling and refining manufacturers

    Tantalum silicide is a compound composed of silicon and tantalum elements, with the chemical formula TaSi2. It has many excellent properties, such as high melting point, excellent conductivity and chemical stability. Waste tantalum silicide is one of the sources of tantalum waste recycling. Tantalum waste recycling also includes tantalum carbide recycling, tantalum oxide recycling, lithium tantalum acid recycling, tantalum silicide recycling, metal tantalum recycling, tantalum nitride recycling, tantalum powder recycling, tantalum capacitor recycling, etc.

    Product Details

    Tantalum silicide is a compound composed of silicon and tantalum elements, with the chemical formula TaSi2. It has many excellent characteristics, such as high melting point, excellent conductivity, and chemical stability. These characteristics make tantalum silicide an ideal material in the field of electronic devices. It is widely used in integrated circuits for metal silicide electrodes, wires, and resistors. In addition, tantalum silicide also has excellent mechanical properties and high-temperature resistance, making it suitable for applications in high-temperature environments, such as high-temperature sensors and aviation engine components.

    There are various methods for preparing tantalum silicide, and the following will introduce two commonly used preparation methods: 1. Chemical Vapor Deposition (CVD) method: Chemical Vapor Deposition is a commonly used method for preparing thin film materials, which is also applicable to the preparation of tantalum silicide. This method involves introducing precursor materials of tantalum and silicon, such as silane and tantalum acyl compounds, into the reaction chamber to undergo a gas-phase reaction at high temperature to generate tantalum silicide. The atmosphere and temperature in the reaction chamber need to be accurately controlled to ensure the progress of the reaction and the purity of the product. Uniform and dense tantalum silicide thin films can be prepared by CVD method, which is suitable for the preparation of microelectronic devices. 2. Reaction sintering method: Reaction sintering method is a commonly used method for preparing tantalum silicide bulk materials. This method first mixes tantalum powder and silicon powder evenly in a certain molar ratio, and then sintering at high temperature. During the sintering process, tantalum reacts with silicon to form tantalum silicide and form a block like material. The advantage of this method is that it is simple and feasible, and can prepare high-density and high-purity tantalum silicide materials. However, due to the high sintering temperature, it is easy to cause grain growth and material deformation. Therefore, for some special shapes and sizes of tantalum silicide products, further processing and molding may be necessary.

    Waste tantalum silicide is one of the sources of tantalum waste recovery. The recovery of tantalum waste includes Tantalum carbide recovery, tantalum oxide recovery, tantalum lithium oxide recovery, tantalum silicide recovery, metal tantalum recovery, tantalum nitride recovery, tantalum powder recovery, tantalum capacitor recovery, etc. If you have any demand for tantalum containing waste recycling, please call our 24-hour service hotline. Dingfeng Precious Metal Recycling and Refining Factory has its own recycling and refining factory without intermediaries to earn price differences. Our professional technical team and customer service personnel provide one-on-one services to ensure customer privacy during the recycling process.

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